Ion/Plasma Material Modification Lab

Lab Head: Eng. Marek Barlak, PhD
e-mail: marek.barlak@ncbj.gov.pl

Plasma surface engineering

  • Energy dosing in pulsed-plasma processes
  • Synthesis and characterization of layers deposited by means of plasma surface engineering techniques
  • Development of plasma surface engineering techniques (in particular pulsed-plasma techniques)

Modification of materials with ion/plasma beams

  • Modification of surfaces of materials by ion/plasma/electron beams
  • Synthesis of non-equilibrium structures
  • Synthesis of new materials

Lab equipment

A. Technological equipment

  • Pulse Magnetron Sputtering (PMS)
  • Gas Injection Magnetron Sputtering (GIMS)
  • Flat cathode arc UHV set-up
  • Vacuum sputtering
  • MEVVA high current metallic ion implanter
  • Semi-industrial implanter of gaseous ions
  • Electron gun
  • RPI-type plasma gun

B. Test equipment

  • Scanning microscope with EDS probe
  • Ball-disc tribotester
  • UHV set-up for testing quantum yield of photocathodes

 

Pulse Magnetron Sputtering (PMS) and Gas Injection Magnetron Sputtering (GIMS)
Set-up for flat cathode arc sputtering
Set-up for flat cathode arc sputtering
Vacuum sputtering chamber
Vacuum sputtering
MEVVA high-current metalic ion implanter
MEVVA high-current metalic ion implanter
Semi-industrial implanter of gaseous ions